Assume that an ntype silicon has been doped with a dopant co
Solution
at T= 2750k
Given ND=2.3X1017cm-3 to find Electron concentration(Ne) and Hole concentration(Np)
1. At T = 2750k the value of intrinsic concentration is ni = 9.65 X109 cm-3 and Na = 0
Electron concentration is Ne = 1/2{(ND-Na)+((ND-Na)2 + 4ni2)1/2}
= 1/2{(2.3X1017-0)+((2.3X1017-0)2 + 4(9.65 X109 )2)1/2}
= 1/2{(2.3X1017)+(5.29X1034 + 3.7X1020 )1/2} = 2.3X1017 cm-3
and Hole concentration is Np = ni2/Ne = (9.65 X109 cm-3)2/ 2.3X1017 cm-3 = 404.8cm-3
2. At T = 3000k the value of intrinsic concentration is ni = 1.01 X109 cm-3 and Na = 0
Electron concentration is Ne = 1/2{(ND-Na)+((ND-Na)2 + 4ni2)1/2}
= 1/2{(2.3X1017-0)+((2.3X1017-0)2 + 4(1.01X109 )2)1/2}
= 1/2{(2.3X1017)+(5.29X1034 + 4.08X1018 )1/2} = 2.3X1017 cm-3
and Hole concentration is Np = ni2/Ne = (1.01 X109 cm-3)2/ 2.3X1017 cm-3 = .43x102 cm-3
3. At T = 3250k the value of intrinsic concentration is ni = 6.6 X1010 cm-3 and Na = 0
Electron concentration is Ne = 1/2{(ND-Na)+((ND-Na)2 + 4ni2)1/2}
= 1/2{(2.3X1017-0)+((2.3X1017-0)2 + 4(6.6X1010 )2)1/2}
= 1/2{(2.3X1017)+(5.29X1034 + 4.35X1021)1/2} = 2.3X1017 cm-3
and Hole concentration is Np = ni2/Ne = (6.6 X1010 cm-3)2/ 2.3X1017 cm-3 = 1.8x102 cm-3

