Assume you are having problems with photoresist adhesion so

Assume you are having problems with photoresist adhesion, so you double the sample soft bake time. If you want the photoresist develop time to be the same, should you increase or decrease the UV exposure time?

Solution

Doubling the soft bake time will adequately remove the solvent from the coating. Thus the UV exposure time will need to be reduced, so as to keep the development time to be unchanged.