MEMS 1Describe the properties of positive and negative photo

(MEMS)

1-Describe the properties of positive and negative photoresists in photolithography.

2)E-beam lithography

a) Writes patterns using EUV wavelengths.

b)Writes patterns using electron beams.

c)Writes whole wafers in a single exposure.

d)Uses immersion techniques to achieve high resolution

3) Laser Interference lithography

A)Writes periodic patterns written by interfering two or more beams of light.

B)Can only be used on a metal substrate.

C)Is a contact patterning method.

D)Is prone to stitching errors.

4) Silicon properties do not include

A) A Direct band gap semiconductor

B) P-doping

C) N-doping

D) Fourteen electrons

E) Four nearest neighbor atoms in a 3D crystalline structure.

Solution

2-B

3-A